Array i-line photoresist, full name of positive i-line (365 nm) photoresist for TFT array processes, belongs to the DNQ-Novolac (diazo-naphthoquinone-novolac) positive resist system. It is the core photosensitive material for yellow-light lithography on LCD/OLED TFT array substrates, compatible with the 365 nm i-line UV light source of FPD exposure tools, and is used for precise circuit pattern transfer.