Micro Lens Hard Mask photoresist is a photoresist used to form the microlens array of CMOS Image Sensors (CIS). After thermal reflow, it can serve as an etching template to form the microlens array, featuring fast photosensitivity and deep depth of focus. Micro Lens Underlayer is a transparent underlying material used to form the microlens array, which is patterned by Hard Mask etching. It features high transparency and excellent aging resistance.