KrF photoresist is a class of photoresist using KrF excimer laser (248 nm) as the exposure source, applied to various semiconductor lithography processes with resolution of 130 nm and above. The company's product line covers multiple grades; the main grades are used for logic active area, polysilicon gate, ion implantation and metal interconnect layers, as well as multi-step staircase profile etching in 3D NAND. The products feature vertical profiles, stable structures, strong etch resistance and good heat resistance.