ArF photoresist is a class of photoresist using ArF excimer laser (193 nm) as the exposure source, including ArF dry photoresist and ArF immersion photoresist, applied to various semiconductor lithography processes with resolution below 110 nm. The company's products are suitable for active area, polysilicon gate, contact hole and back-end metal line definition processes, mainly used in memory (DRAM, 3D NAND) and advanced logic chip manufacturing. The products feature excellent process window, high resolution and strong quality stability.