BARC (Bottom Anti-Reflective Coating) is a class of anti-reflective coating materials applied beneath the photoresist. By absorbing light, it suppresses the light reflected upward from the substrate, reduces and eliminates the standing wave effect in the photoresist and improves the exposure performance of the photoresist. It covers processes from conventional 365 nm (i-line) to advanced 193 nm immersion. It features customizable process windows, good compatibility with photoresists and high pattern fidelity.